Precision Ion Polishing System
Precision Ion Polishing System
Method for preparation
The Precision Ion Polishing System is used to produce high-quality TEM-samples.
Two independent argon ion sources allow high sputtering rates. The accelaration voltage is tunable between 100eV and 8keV. A focussing electrode allows high rates even for low voltages (< 3keV) and small incident angles (< 3°).
A whisperlok allows quick and easy sample tranfer. A digital microscope can be used to monitor the thinning process by video.
Specifications:
| Incident angle: | 2x +/-10° sources controlled independtly |
| Acceleration voltage: | 0.1 - 8 keV |
| Ion density | : max. 10 mA/cm² |
| X,Y-Transfer | +/- 0,5 mm |
| Load-Lock: | Gatan Whisperlok, transfertime (not cooled) < 1min |
| Sample temperature: | between -120°C and +50°C |
| Vacuum system: | oil-free, diaphragm pump (DP) und turbomolecular pumpe (MDP) |
It is possible to sputter the sample on both sides, or in two areas on the same side, simultanously.