Ion Slicer
Ion Slicer
Method for preparation
Description:
The Ion Slicer is used for the preparation of thin films using argon ion sputtering.
With this method samples for TEM-, STEM-, SEM- or SPM-investigations can be fabricated without the need for any chemicals.
The argon ions have a small incident angly onto the sample surface, minimizing radiation damage and amorphisation.
The sample can be tiltes by 30°, to achieve a homogenously polished area.
Specifications:
Acceleration voltage: | 1-8 kV |
Sputter rate: | 5µm/min |
Sample size: | 0.8 mm (B )x 2.8 mm (L)x 0.1 mm (H) |
Sample rotation: | +/-30° |
Gas für ion beam: | Argon |
Incident angle: | 0°-6° |
Pressure gauge: | Penning tube |
Main pump: | turbomolecular pump(TMP) |
Pre pump: | rotary vane pump |